JPS6075835A - ペリクル - Google Patents

ペリクル

Info

Publication number
JPS6075835A
JPS6075835A JP58182993A JP18299383A JPS6075835A JP S6075835 A JPS6075835 A JP S6075835A JP 58182993 A JP58182993 A JP 58182993A JP 18299383 A JP18299383 A JP 18299383A JP S6075835 A JPS6075835 A JP S6075835A
Authority
JP
Japan
Prior art keywords
adhesive
pellicle
mask substrate
mask
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58182993A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0362261B2 (en]
Inventor
Fumio Mizuno
文夫 水野
Nobuhiro Otsuka
大塚　伸宏
Shigehiko Yamaguchi
山口　繁彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO SEROFUANSHI KK
Hitachi Ltd
Original Assignee
TOKYO SEROFUANSHI KK
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO SEROFUANSHI KK, Hitachi Ltd filed Critical TOKYO SEROFUANSHI KK
Priority to JP58182993A priority Critical patent/JPS6075835A/ja
Publication of JPS6075835A publication Critical patent/JPS6075835A/ja
Publication of JPH0362261B2 publication Critical patent/JPH0362261B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58182993A 1983-10-03 1983-10-03 ペリクル Granted JPS6075835A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58182993A JPS6075835A (ja) 1983-10-03 1983-10-03 ペリクル

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58182993A JPS6075835A (ja) 1983-10-03 1983-10-03 ペリクル

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP6075692A Division JPH07175206A (ja) 1994-04-14 1994-04-14 ペリクル

Publications (2)

Publication Number Publication Date
JPS6075835A true JPS6075835A (ja) 1985-04-30
JPH0362261B2 JPH0362261B2 (en]) 1991-09-25

Family

ID=16127873

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58182993A Granted JPS6075835A (ja) 1983-10-03 1983-10-03 ペリクル

Country Status (1)

Country Link
JP (1) JPS6075835A (en])

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6284047U (en]) * 1985-11-13 1987-05-28
JPS62156957U (en]) * 1986-03-25 1987-10-05
JPS6448062A (en) * 1987-08-18 1989-02-22 Mitsui Petrochemical Ind Dustproof film
JPH0278945U (en]) * 1988-12-07 1990-06-18
JPH0320737A (ja) * 1989-06-16 1991-01-29 Matsushita Electron Corp フォトマスク
WO1991002294A1 (en) * 1989-08-10 1991-02-21 Daicel Chemical Industries, Ltd. Dust-preventing film
JPH09204038A (ja) * 1996-09-24 1997-08-05 Hitachi Ltd マスクの製造方法
US6261423B1 (en) * 1999-08-04 2001-07-17 Honeywell International Inc. Sputtering process
EP1220035A3 (en) * 2000-12-27 2002-09-11 Mitsui Chemicals, Inc. Pellicle
EP2120093A1 (en) * 2008-05-14 2009-11-18 Shin-Etsu Chemical Co., Ltd. Pellicle for use in semiconductor lithography
WO2010026938A1 (ja) * 2008-09-08 2010-03-11 電気化学工業株式会社 半導体製品の製造方法
JP2014215588A (ja) * 2013-04-30 2014-11-17 凸版印刷株式会社 ペリクル付きフォトマスクとその製造方法及びペリクル粘着耐久性検査装置
CN107608175A (zh) * 2016-07-11 2018-01-19 信越化学工业株式会社 薄膜组件用粘着剂、薄膜组件和选择薄膜组件用粘着剂的方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5478463B2 (ja) * 2010-11-17 2014-04-23 信越化学工業株式会社 リソグラフィー用ペリクル

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6284047U (en]) * 1985-11-13 1987-05-28
JPS62156957U (en]) * 1986-03-25 1987-10-05
JPS6448062A (en) * 1987-08-18 1989-02-22 Mitsui Petrochemical Ind Dustproof film
JPH0278945U (en]) * 1988-12-07 1990-06-18
JPH0320737A (ja) * 1989-06-16 1991-01-29 Matsushita Electron Corp フォトマスク
WO1991002294A1 (en) * 1989-08-10 1991-02-21 Daicel Chemical Industries, Ltd. Dust-preventing film
JPH09204038A (ja) * 1996-09-24 1997-08-05 Hitachi Ltd マスクの製造方法
US6261423B1 (en) * 1999-08-04 2001-07-17 Honeywell International Inc. Sputtering process
EP1220035A3 (en) * 2000-12-27 2002-09-11 Mitsui Chemicals, Inc. Pellicle
EP2120093A1 (en) * 2008-05-14 2009-11-18 Shin-Etsu Chemical Co., Ltd. Pellicle for use in semiconductor lithography
JP2009276504A (ja) * 2008-05-14 2009-11-26 Shin Etsu Chem Co Ltd 半導体リソグラフィー用ペリクル
WO2010026938A1 (ja) * 2008-09-08 2010-03-11 電気化学工業株式会社 半導体製品の製造方法
JPWO2010026938A1 (ja) * 2008-09-08 2012-02-02 電気化学工業株式会社 半導体製品の製造方法
JP2014215588A (ja) * 2013-04-30 2014-11-17 凸版印刷株式会社 ペリクル付きフォトマスクとその製造方法及びペリクル粘着耐久性検査装置
CN107608175A (zh) * 2016-07-11 2018-01-19 信越化学工业株式会社 薄膜组件用粘着剂、薄膜组件和选择薄膜组件用粘着剂的方法
JP2018021182A (ja) * 2016-07-11 2018-02-08 信越化学工業株式会社 ペリクル用粘着剤、ペリクル、ペリクル用粘着剤の選択方法
JP2022043086A (ja) * 2016-07-11 2022-03-15 信越化学工業株式会社 ペリクル用粘着剤、ペリクル、ペリクル用粘着剤の選択方法
JP2022126717A (ja) * 2016-07-11 2022-08-30 信越化学工業株式会社 ペリクル用粘着剤、ペリクル、ペリクル用粘着剤の選択方法
CN107608175B (zh) * 2016-07-11 2023-04-07 信越化学工业株式会社 薄膜组件用粘着剂、薄膜组件和选择薄膜组件用粘着剂的方法

Also Published As

Publication number Publication date
JPH0362261B2 (en]) 1991-09-25

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees